How To Get A Japan Visa For Indians In A Few Days?

Japan – a country popularly known for the rising sun, & also responsible for the innovation of many technical tools. Japan is rising unstoppably like the sun and this growing nature of a country attracts many Indian visitors to the country every year. Every nation demands visas from every international visitor it is essential to hold a Japan visa for Indians for every Indian visitor who wishes to visit Japan.

Nowadays, applying for a Japanese visa for Indians is not a tough task as it was earlier. Just a mindful procedure along with effective guidance can fall everything at a place. Japan visa application begins with choosing a type, as per your purpose of visit.

The following are some popular & majorly demanded types of visas by Indian citizens.

Tourist visa: – Applicant who wants to visit Japan for enjoying their vacation/holiday are eligible for applying for a Japan tourist visa.
Visitors’ visa: – Applicants who want to visit Japan for visiting their friend, family members, etc. can apply for Japan visitor’s visa.
Business visa: – Japan’s business visa is issued by those applicants who take a visit for business purposes like attending meetings, seminars, conferences, etc.
Work visa: – A work visa is issued only for selective field members & especially by the employers of companies, media reporters, etc.

Once you decide the type of visa, the next step would be of gathering documents as per your motive of visit.

Here is some of the basic list of documents that are essential for applying a Japan visa for Indians.

Original valid passport with minimum 6-months validity with minimum 2 blank pages for visa stamp.
3 recent photographs with 2inches x 2 inches size. A photograph should be against a white background, should cover a minimum of 80% face and should not be much older than 3-months.
Japan visa application form.
Personal covering letter addressing to the Japan embassy.
Confirmed return flight ticket.
Hotel reservation.
Bank statements of the last 3-months with stamped and sealed by the bank.
Income tax returns of the last 3-years.
For salaried applicants – Travel NOC from company/ approved leave application by the company on the company’s letterhead.
For self-employed applicants – Ownership proof/GST certificate.
Day-wise itinerary.
In the case of a minor applicant, it is essential to have a parent’s signature on both; covering letter & visa application form.

For business visa applicants it is essential to submit below-listed documents too.

Original covering letter on the letterhead of an Indian company.
Invitation letter from a Japanese company on its letterhead.

In case you have received an invitation to visit Japan from your friends, family member or any other relatives, you have to submit the below-listed documents.

Original invitation letter with stated a valid reason for an invitation along with a guarantor letter.
Original JHUMIYO letter as inviter’s proof of Japanese citizenship.
Scanned passport copy from front & back.
Residential card (NIRC card).
Residential address.
Contact details.

In case your Japanese trip is sponsored by someone then you have to submit the following listed documents.

Letter of sponsorship with stated valid reason for sponsoring & relationship with an applicant.
Copy of valid passport.
Bank statements.
Proof of employment.
Income tax returns of the last 3-years.
Financial papers – car papers, mutual funds, fixed deposits, savings, etc.

It is always suggested to take the help of trusted visa agents, especially when you are applying for the first time. Because, visa agents have mastery in preparing a cover letter, filling an application form, important bookings, and providing other guidance.

Once you submit your documents to your visa agents they will first verify all your documents and begins with preparing your personal cover letter. Covering letters contain all the important personal and visa-related information of an applicant. Personal information like applicant’s name, date of birth, family details, educational details, employment details, marital status, etc. whereas, visa-related details like past international travel history, current visiting purpose, passport details, details regarding returning back to the home country, etc.

Once done with filling covering letter appropriately, the next step is, to begin with filling an online application form for the Japan visa. It is important to make sure that detail of covering letter and visa application letter should be similar & form needs to be duly filled & signatories by the applicant. Once complete with the filling procedure the next step would be submission.

Japan visa for Indians is an offline visa application procedure in which an applicant has to visit the Japan embassy & submit all the documents. Once submission of your visa application is done, you have to wait just for 4-5 working days to receive the final decision from the embassy. However, these days can be varied as per the workload, availability of workforce and other factors.

When your visa application will get approved by the Japanese embassy you will receive an e-mail or other notifications on your registered means of communication and you can collect your Japanese visa stamped passport, from the embassy, your personal visa agents or can get it by courier facility.

With a valid Japan visa, a tourist applicant can stay a maximum of 15 days. For other types of visa, application validity will be based on the embassy’s discretion.

In case your Japan visa application is being rejected by the Japan embassy you cannot re-apply until 180-days. To save yourself from such end moment rejections and worry-free proceduresFeature Articles, it is always a better option to apply soon & take expert advice.

Hygiene Standards in the time of COVID-19

At Workafella, we don’t just provide high-energy office space in hitech city, we create workspaces that promote wellbeing as well

In the wake of the COVID-19 outbreak, we are taking precautionary measures to help minimise the chances of the spread. Given that we take the safety of our members seriously, we have taken proactive steps to ensure hygiene.

Enter our centres and the first thing you will find is alcohol-based hand sanitizers placed at the entry point and various places inside. Since our centres are visited by vendors and guests, we’ve ensured to put a thermal scan in place. The thermal scanner will check the body temperature. Anybody with a body temperature above 99.0 °F will be directed to nearest health care centre for a precautionary check-up. We’ve have placed our measures in tandem with WHO’s guidelines. All our centres are continuously sanitized. We are also sanitizing door handles and work desks every hour

Since lifts are confined office space in hyderabad where buttons are pressed with bare fingers, you will also find a simple yet effective tool which is aimed at reducing contact. A sponge plugged with multiple toothpicks is placed next to the buttons in the lifts so that members use that instead of their finger. A plastic cup placed can be to throw the toothpicks. You will also find display posters promoting hand-washing and social distancing in the lifts.

We have specific areas dedicated to quarantine if any of our community members need assistance. Our housekeeping staff, security and Workafella executives are continually trained to wear a mask, wash hands frequently and are informed about the best practices in safety and hygiene.

A reiteration of the precautionary measures include:

Alcohol-based hand sanitizers are placed at the entry point and inside the centre.
A deep cleaning is done at all our centres.
Our housekeeping staff have increased the frequency of the cleaning schedule at the centre.
All our centres are continuously sanitized. We will also be sanitizing door handles and work desks.
A Thermal scanner will be present at all our centres. This will check the body temperature.
All vendors and visitors will have to get a thermal scan check done.
Workafella executivesFree Web Content, security and housekeeping staff will be wearing masks.
We’ve also issued advisory to our community members asking them to visit the nearest health centre if they show symptoms.

We hope to bring about positive change during this time. Together let’s stay calm and safe.

New Semiconductor Materials and Impurity Defects

I Wide Band Gap Semiconductor Materials Gallium nitride, silicon carbide, and zinc oxide are all wide bandgap semiconductor materials, because their forbidden bandwidths are all above 3 electron volt…

I Wide Band Gap Semiconductor Materials

Gallium nitride, silicon carbide, and zinc oxide are all wide bandgap semiconductor materials, because their forbidden bandwidths are all above 3 electron volts, and it is impossible to excite valence band electrons to the conduction band at room temperature. The operating temperature of the device can be very high, such as silicon carbide, of which temperature can reach 600 degrees Celsius. If a diamond is made into a semiconductor, the temperature can be higher, and it can be used to collect relevant information on an oil drill probe.

They’re also applied in harsh environments such as aviation and aerospace. The only high-power transmitting tube of radio stations and television stations is still electron tubes not semiconductor devices. The life of this kind of tube is only two or three thousand hours, it is bulky, and consumes a lot of power. If we use silicon carbide high-power emitting devices, the volume can be reduced by at least tens to hundreds of times, and the service life will be greatly increased. Therefore, wide bandgap semiconductor materials are very important new semiconductor materials.

However, this material is very difficult to grow. It’s easy to grow silicon on silicon and grow GaAs on gallium arsenide, but most of this material does not have a bulk material, and we have to use other materials as the substrate. For example, gallium nitride is generally grown on a sapphire substrate. The thermal expansion coefficient and lattice constant of sapphire and gallium nitride are very different so that the grown epitaxial layer has many defects, which is the biggest problem and difficulty at present. In addition, processing and etching of this material are also very difficult. Scientists are working to solve this problem for a more broad space for new materials.

II Low-dimensional Semiconductor Materials

In fact, the low-dimensional semiconductor materials mentioned here are nanomaterials. One of the important purposes of developing nanometer science and technology is to control and manufacture powerful of nanoelectronics, optoelectronic devices and circuits, nano-biosensors, etc. with superior performance to benefit humans on the scale level of atoms, molecules and nanometers. It can be expected that the development and application of nanotechnology will not only completely change people’s production and life, but will also change the socio-political pattern and forms of confrontation in war, which is why people attach great importance to the development of nano-semiconductor technology.

The electrons in the bulk material can move freely in three dimensions. But when the feature size of the material is smaller than the mean free path of the electron in one dimension, the movement of the electron in this direction will be limited, and the energy of the electron is no longer continuous, but quantized. We call this material a superlattice, quantum well material. For quantum wire material, the electron can only move freely along the direction of the quantum wire, and the other two directions are restricted. And in quantum dot materials, the size of the material in three dimensions is smaller than the mean free path of the electrons. The electrons cannot move freely and the energy is quantized in all three directions.

Due to the above reasons, the state density function of the electron has also changed. The state density function of bulk material is a parabola, and the electrons can move freely on it. If it is a quantum dot material, its state density function is completely isolated distributed, which is the same as a single molecule or atom. Powerful quantum devices can be manufactured based on this feature.

The memory of LSI is realized by charging and discharging a large number of electrons. The flow of a large number of electrons requires a lot of energy, causing the chip to heat up, which limits the degree of integration. If a single or several electrons are used for memory, not only the integration degree can be improved, but the power consumption problem can also be solved. The efficiency of lasers is not high, because the wavelength of the laser changes with temperature. Generally, the wavelength is red-shifted as the temperature increases, so in fiber-optic communications, the temperature of the laser must be controlled. If quantum dot lasers can be used to replace existing quantum well lasers, these problems will be solved.

GaAs and InP-based superlattices and quantum well materials have developed very maturely and are widely used in the fields of optical communications, mobile communications, and microwave communications. Quantum cascade laser is a kind of unipolar device, which is a new type of mid- and far-infrared light source developed in the past ten years It has important application prospects in free-space communication, infrared countermeasures and remote-control chemical sensing. It has high requirements for the preparation process of MBE(molecular beam epitaxy), and the entire device has hundreds to thousands of layers, and the thickness of each layer must be controlled to a few tenths of nanometers.

III Impurities and Defects in Semiconductor Materials

Most of the methods of impurity control are doping a certain number of impurity atoms when the crystal grows. The final distribution of these impurity atoms in the crystal depends not only on the growth method itself, but also on the choice of growth conditions. For example, when the crystal is grown by the Czochralski method, impurity segregation and the irregular convection in the melt will cause fluctuations in the impurity distribution. Besides, no matter which crystal growth method is used, impurities will be introduced into the container, heater, ambient atmosphere and even the substrate during the growth process. This situation is called the autodoping. Crystal defect control is also achieved by controlling crystal growth conditions, such as the symmetry of the thermal field around the crystal, temperature fluctuations, environmental pressure, growth rate, etc., With the decreasing of the device size, there is also a limit to the microcell unevenness of impurity distribution in the crystal and the small defects of the order of atomic magnitude. Therefore, in the process of semiconductor materialsFind Article, how to carefully design and strictly control the growth conditions to meet the various requirements for impurities and defects in semiconductor materials is the central issue.